FIELD: electricity.
SUBSTANCE: in vacuum-arc device, analog control unit, switching device and additional ballast resistances the value of which determines cathode clearance current and heating current respectively are included.
EFFECT: providing stable fault-free operation of extended structure plasma source, thickness uniformity of coating formed on treated products, accelerated cathode entering into operational mode.
3 dwg
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Authors
Dates
2012-04-27—Published
2010-11-30—Filed