VACUUM-ARC PLASMA SOURCE Russian patent published in 1997 - IPC

FIELD: vacuum-plasma technology; coating lengthy parts in electronic engineering and commodities production. SUBSTANCE: vacuum-arc plasma source has lengthy cathode with arc- quenching screen placed on cathode current supply end, firing electrode, and anode; in addition, it is provided with lengthy magnetic system oriented along cathode. Magnetic system may be made in the form of lap winding or permanent magnets. Components of magnetic-field flux density vector along working zone of cathode lie on plane perpendicular to its symmetry axis. This ensures uniform thickness of applied coat on lengthy part. EFFECT: improved utilization factor of plasma-forming material. 3 cl, 3 dwg