DEVICE AND METHOD OF PRODUCING HIGH VACUUM IN SYSTEM WITH ULTRAHIGH VACUUM Russian patent published in 2002 - IPC

FIELD: devices and methods of high vacuum production. SUBSTANCE: device has metal chamber capable of gas liberation from its surface which consists of coating applied to at least major part of metal wall surface forming chamber. Coating has at least one layer presenting nonevaporable getter applied to surface of metal wall. Applied to getter layer is at least one thin layer of at least one catalyst selected from group including ruthenium and/or rhodium, and/or palladium, and/or osmium, and/or iridium, and/or platinum, and/or alloy containing at least one of said metals. Method of production of high vacuum in system with ultrahigh vacuum is realized with use of catalyst in chamber formed by metal wall capable of gas liberation on its surface. At least one thin layer of nonevaporable getter is applied to at least major part of chamber wall surface. The at least one thin layer is applied of at least one catalyst presented by said metals or alloy to said getter layer. Chamber is connected with vacuum system and vacuum is produced with the help of system of pump evacuation. Use of given group of inventions allows reduction of degassing degree on surface of chamber walls and increase of efficiency of evacuation means. EFFECT: higher efficiency. 9 cl