PROCESS OF ELECTRON-ION NITRIDING OF LARGE-SIZED ARTICLES IN LOW-TEMPERATURE GASEOUS-DISCHARGE PLASMA AND FACILITY FOR ITS IMPLEMENTATION Russian patent published in 2003 - IPC

FIELD: mechanical engineering, ion-plasma machining. SUBSTANCE: process includes heating of articles by gaseous-discharge plasma with simultaneous utilization of electron and ion components of gaseous-discharge plasma. One article is at positive potential and is heated by electron component of gaseous-discharge plasma and simultaneously second article which is at negative potential is subjected to action of ion component of gaseous-discharge plasma. When preset temperature is reached potentials at articles are changed in turn over the whole cycle of nitriding. Facility for implementation of process has chamber with evacuation system that houses cathode of electric arc evaporator 6 separated by opaque screen 7, substrate holder 1 with articles, needle gas leak 9, power supply sources 4 and 5 with switch, second substrate holder 2 connected to positive potential used as additional anode. EFFECT: increased efficiency of utilization of gaseous-discharge plasma, enhanced productivity of electron-ion nitriding. 2 cl, 1 dwg