QUICK-RESPONSE RESISTIVE SENSOR OF EXPOSABLE CONCENTRATIONS OF HYDROGEN ( VARIANTS ) AND PROCESS OF ITS MANUFACTURE Russian patent published in 2004 - IPC

Abstract RU 2221241 C1

FIELD: measurement technology, measurement of concentrations of hydrogen. SUBSTANCE: invention can find use in manufacture of gas analyzers of exposable concentrations of hydrogen in spacecraft equipment, in automotive and chemical industries. Technical result of invention lies in increase of response of sensor up to 0.1 s. Proposed quick-response resistive sensor of exposable concentrations of hydrogen ( over 1.0 per cent by volume ) has insulation substrate, hydrogen-sensitive thin-film element applied to substrate, heating element that heats hydrogen-sensitive thin-film element. Hydrogen-sensitive thin-film element is fabricated from material containing palladium subjected to thermal treatment to ensure formation of palladium oxide or from palladium oxide changing into metal palladium under action of hydrogen. In correspondence with another variant manufacture of hydrogen-sensitive thin-film resistive sensor of exposable concentrations of hydrogen consists in formation of thin metal film on insulation substrate and in possibility of its heating by heating element. Thin metal film is fabricated from palladium, it is heated for short time period to ensure formation of palladium oxide without total oxidation of metal film. EFFECT: increased operational response of sensor. 6 cl, 2 dwg

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RU 2 221 241 C1

Authors

Nikolaev I.N.

Nikolaeva A.I.

Detinina O.I.

Dates

2004-01-10Published

2002-11-19Filed