METHOD OF MANUFACTURING A THIN FILM RESISTOR Russian patent published in 2019 - IPC H01C17/00 

Abstract RU 2700592 C1

FIELD: electricity.

SUBSTANCE: invention relates to a method of making a thin-film resistor, in which before deposition of a resistive layer and formation of contact pads, an additional layer (film) of a semiconductor material based on oxides of transition metals is first applied on a dielectric substrate, where the value of specific surface resistance of the additional layer is determined based on the criterion of minimizing the TCR of the two-layer structure on one side and providing effective protection against local thermal inhomogeneities on the other side.

EFFECT: improves operational characteristics of thin-film resistors by load capacity, temperature stability, TCR, reliability.

3 cl, 3 tbl

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RU 2 700 592 C1

Authors

Novozhilov Valerij Nikolaevich

Dates

2019-09-18Published

2018-10-02Filed