FIELD: electricity.
SUBSTANCE: invention relates to a method of making a thin-film resistor, in which before deposition of a resistive layer and formation of contact pads, an additional layer (film) of a semiconductor material based on oxides of transition metals is first applied on a dielectric substrate, where the value of specific surface resistance of the additional layer is determined based on the criterion of minimizing the TCR of the two-layer structure on one side and providing effective protection against local thermal inhomogeneities on the other side.
EFFECT: improves operational characteristics of thin-film resistors by load capacity, temperature stability, TCR, reliability.
3 cl, 3 tbl
Title | Year | Author | Number |
---|---|---|---|
METHOD OF MAKING THIN-FILM RESISTOR | 2008 |
|
RU2374710C1 |
PRECISE THIN-FILM RESISTOR | 2010 |
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THIN-FILM RESISTOR | 0 |
|
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POWERFUL HF- AND MF-TRANSISTOR STRUCTURE | 2020 |
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RU2743674C1 |
TEMPERATURE-VOLTAGE CONVERTER | 2008 |
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RU2374709C1 |
METHOD OF MANUFACTURE OF HIGH-TEMPERATURE THIN-FILM RESISTOR | 2007 |
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RU2326460C1 |
Authors
Dates
2019-09-18—Published
2018-10-02—Filed