FIELD: processes and equipment for deposition of thin films, possibly used at making magnetic pickups.
SUBSTANCE: method comprises steps of layer-by- layer deposition of magnetic and dielectric materials in vacuum while applying outer magnetic field to deposition plane and heating substrate; further annealing of the whole structure; depositing layers of alloy Fe - Ni at rate no less than 30 Е/s and layers of silica - at rate no less than 250 Е/s in condition of technical vacuum onto substrate heated up to 280 -300 C; annealing prepared structure for 30 min at the same temperature.
EFFECT: enhanced operational characteristics of magnetic field pickup, possibility for making magnetic layers with equal and small coercivity, improved efficiency of method due to reduced operation cycle.
2 tbl, 1 ex
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