FIELD: magnetic materials technology.
SUBSTANCE: invention relates to vacuum thin film sputtering area and can be used in magnetic record systems and sensors based on magneto-resistive effect. Magnetic alloy Fe-Ni and SiO2 are deposited layer-by-layer in vacuum under action of external magnetic field applied to precipitation plane, after which resulting structure is baked. Sputtering velocity of magnetic alloy Fe-Ni is changed from one layer to the next during one sputtering cycle.
EFFECT: enabled preparation of magnetic films with varied magnetic properties.
6 dwg
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Authors
Dates
2008-01-27—Published
2004-08-30—Filed