METHOD FOR MANUFACTURING MAGNETORESISTIVE NANOSTRUCTURES Russian patent published in 2022 - IPC H01L43/08 

Abstract RU 2767593 C1

FIELD: magnets.

SUBSTANCE: invention relates to the field of manufacturing magnetoresistive nanostructures with a giant magnetoresistive effect, and can be used in developing magnetic field sensors, memory and logic elements. In the method for manufacturing magnetoresistive nanostructures, consisting in vacuum deposition of an antiferromagnetic layer, a magnetically hard layer of a NiFeCo alloy, a copper layer, and a magnetically soft layer of a NiFeCo alloy on a substrate of monocrystalline silicon coated with a protective layer of SiO2, the antiferromagnetic and the magnetically hard layers are produced in one production cycle of deposition of the NiFeCo alloy at a temperature of the substrate no lower than the temperature of oxidation of the alloy in air, and subsequent annealing of the layer in vacuum at a residual pressure (2 to 4)×10-6 mm. Hg at the same temperature for at least one hour, cooling to room temperature, and subsequent spraying of the copper layer and the magnetically soft layer made of the NiFeCo alloy, wherein the multilayer magnetoresistive nanostructure is deposited when a magnetic field of 160E or more is applied along the surface of the substrate.

EFFECT: increase in the manufacturability of magnetoresistive nanostructures resulting in a high value of the coercive force of the magnetically hard layer.

1 cl, 2 dwg

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RU 2 767 593 C1

Authors

Gorokhov Sergej Viktorovich

Dates

2022-03-17Published

2021-07-19Filed