CONTROLLED-PARAMETER REPETITIVE-PULSE CHEMICAL LASER (ALTERNATIVES) Russian patent published in 2004 - IPC

Abstract RU 2237955 C2

FIELD: quantum electronics.

SUBSTANCE: laser has gas-discharge tube placed in cavity and connected to inductance coil, main and additional active-medium excitation pulse sources, and controllable delay line of active-medium excitation pulse source. Laser designed to first and second alternative has in addition storage capacitor with parallel-connected resistor and control pulse length shaper. Laser of third design alternate has in addition diode with parallel-connected resistor and control pulse length shaper.

EFFECT: enhanced operating reliability, reduced mass, size, and cost.

4 cl, 6 dwg

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RU 2 237 955 C2

Authors

Judin N.A.

Dates

2004-10-10Published

2002-05-13Filed