ION BEAM SOURCE Russian patent published in 2005 - IPC

FIELD: device for producing ions used for treatment of part surfaces and coating them.

SUBSTANCE: ion beam source has hollow housing; anode designed for connection with positive pole of dc voltage supply and disposed within housing; cathode designed for connection with negative pole of dc voltage supply and provided with slit used for emitting ions and spaced apart from anode; source of magnetomotive force; and at least one channel for conveying working gas into mentioned hollow housing; novelty is that mentioned hollow housing is at least partially formed by trough closed in axial direction and provided with slit and anode disposed along this trough. The latter may be composed of several sections whose ends are butt-joined together and two or more curvilinear trough-forming sections. Such mechanical design makes it possible to build a number of ion beam sources of different size, shape, and ion beam direction from relatively small set of unified components and to treat parts of complex shape and curvilinear surfaces.

EFFECT: facilitated mass production of different-size ion sources; improved operating characteristics and enlarged functional capabilities of proposed ion sources.

16 cl, 7 dwg