METHOD FOR CREATING EXTREME ULTRAVIOLET IRRADIATION AND SOURCE OF SUCH IRRADIATION USED IN LITHOGRAPHY Russian patent published in 2005 - IPC

Abstract RU 2249926 C2

FIELD: production of extreme ultraviolet irradiation, lithography.

SUBSTANCE: method comprises steps of using at least one solid target that irradiates extreme ultraviolet at interaction with laser beam focused on target surface turned to laser. Such target is capable to irradiate part of irradiation from second surface. Said irradiation part is collected and transmitted for usage.

EFFECT: enhanced efficiency of ultraviolet irradiation source.

11 cl, 6 dwg

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RU 2 249 926 C2

Authors

Babono Daniel'

Marmore Remi

Bonne Lorans

Dates

2005-04-10—Published

2000-11-14—Filed