FIELD: physics.
SUBSTANCE: invention relates to a radiation source based on a laser plasma. Scope of application includes EUV metrology, inspection of micro- and nanostructures, actinic inspection of lithographic EUV masks. Target (4) is a layer of molten metal formed at the action of the centrifugal force on inner surface (16) of distal wall (13) of annular trough (11) formed in rotating target assembly (3). In embodiments of the invention, it is possible to synchronize the moments of the laser pulses with the angles of rotation of the rotating target assembly, which provide a direct visibility between interaction zone (5) and the input and output windows (6), (8) through n pairs of holes (17), (18) in proximal wall (14) of the annular trough, where n is in the range of 10 up to 100.
EFFECT: suppression of a stream of polluting particles in a high-brightness source of short-wave radiation, which ensures an increase in its durability due to extremely low level of contamination.
20 cl, 5 dwg
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