FIELD: radio electronics, electrical engineering, and other industries.
SUBSTANCE: proposed method for manufacturing electrolytic capacitor anode from tantalum includes evaporation of tantalum on substrate surface using sprayed tantalum target, regulation of target spraying power and substrate temperature, followed by molding; for the purpose use is made of developed-surface dielectric substrate; tantalum is evaporated by precipitating it onto developed surface of dielectric substrate moved many times relative to target; film coating is formed at substrate temperature of not over 100 °C; substrate temperature is controlled against ratio of substrate time of exposure to at least one flow of sprayed tantalum particles to time of cooling down beyond this flow; each time when substrate is moved relative to target its surface changes its position relative to sprayed tantalum flow by minimum 20 deg.
EFFECT: enlarged surface of tantalum anode and enhanced specific charge.
1 cl, 1 dwg
| Title | Year | Author | Number |
|---|---|---|---|
| METHOD FOR MANUFACTURING ELECTROLYTIC CAPACITOR ANODE FROM TANTALUM | 2004 |
|
RU2271051C1 |
| METHOD OF FORMING SUPERCONDUCTIVE NIOBIUM NITRIDE FILM COATING AND CONDUCTOR BASED ON THE LATTER | 1999 |
|
RU2173733C2 |
| CORROSION RESISTANT TANTALUM-BASED COATING AND METHOD FOR PRODUCTION THEREOF | 2003 |
|
RU2249061C2 |
| METHOD FOR ALLOYING METALS IN FILMS | 2004 |
|
RU2276206C2 |
| TECHNOLOGY FORMING FILM COAT AND MAGNETRON FACILITY FOR ITS IMPLEMENTATION | 2001 |
|
RU2210619C2 |
| METHOD FOR PRODUCING SUPERCONDUCTING FILM COATING AND CONDUCTOR BUILT AROUND IT | 2000 |
|
RU2199170C2 |
| APPARATUS FOR APPLYING COAT TO BELT | 1999 |
|
RU2167955C2 |
| DEVICE FOR MAGNETRON REACTIVE SPRAYING OF NITRIDE, CARBIDE AND CARBONITRIDE COATINGS | 1993 |
|
RU2065507C1 |
| PROCESS FORMING FILM COAT AND FACILITY FOR ITS REALIZATION | 2001 |
|
RU2211881C2 |
| METHOD AND APPARATUS FOR PRODUCING BERYLLIUM OR BERYLLIUM-CONTAINING FOIL | 2000 |
|
RU2194087C2 |
