TECHNOLOGY FORMING FILM COAT AND MAGNETRON FACILITY FOR ITS IMPLEMENTATION Russian patent published in 2003 - IPC

FIELD: deposition of coats, superconducting coats included, utilized in mechanical engineering. SUBSTANCE: technology forming film coat includes magnetron sputtering of targets of cathodes lying in opposition, deposition of sputtered material on backing placed on one side of targets of cathodes coming in the form of anode with ground potential or potential close to ground common for targets of cathodes. Opposite streams of sputtered material are focused by each target with use of cathode potential. Magnetron facility forming film coat includes vacuum chamber, at least two cathodes with targets lying in opposition and magnetic system, systems for evacuation, supply and control over flow rate of gas mixture, backing with device for its attachment located in vacuum chamber. Cathodes are arranged in additional chamber connected to vacuum chamber. Magnetic systems of cathodes are placed on reverse side of each target, cylindrical or truncated cone grid is mounted around each target. Walls of additional chamber are insulated electrically and plane in which centers of targets are arranged is parallel to plane of backing. EFFECT: provision for diminished departure of coat composition from composition of multicomponent targets. 2 cl, 2 dwg