PROCESS FORMING FILM COAT AND FACILITY FOR ITS REALIZATION Russian patent published in 2003 - IPC

FIELD: mechanical engineering, application of coats. SUBSTANCE: process includes magnetron sputtering of opposite targets, deposition of sputtered material on substrate. Sputtered material is directed into mixing zone formed by at least two opposite currents of sputtered material, direction of each opposite current of sputtered material into mixing zone with deviation towards substrate to organize resulting current of sputtered material from mixing zone on to substrate that is moved relative to current. Facility includes vacuum chamber, at least two opposite magnetrons with targets, gear to fix substrate, magnetrons being placed in volume connected to vacuum chamber. Axes of magnetrons form solid angle of 160-180 degrees which vertex faces substrate and is located in plane orthogonal to substrate at distance exceeding distance between targets lying opposite. Gear to fix substrate is built for movement with reference to plane in which vertex of solid angle is located. EFFECT: diminished deviation of coat composition from composition of targets. 2 cl, 2 dwg