FIELD: instrumentation engineering; photoelectronic spectrometers for mechanical engineering.
SUBSTANCE: proposed method that can be used for monitoring various processes by means of proximate analysis of industrial-product surface layers includes following operations: air evacuation from working chamber at pressure of 10-6 to 10-9 torr; cleaning of specimen surface for 0.01 to 0.1 s; specimen irradiation by ionized pulses by end of its cleaning; separation of photoelectron pulses in energy analyzer; their recording by detector; and spectrum processing. According to first alternative, working chamber is formed by surface of specimen being analyzed and sucker-type device mounted thereon. According to second alternative, specimen being analyzed is secured on substrate without destroying it and working chamber is formed by surface of this substrate and sucker-type device disposed thereon.
EFFECT: reduced proximate analysis time due to dispensing with mechanical treatment of specimen, heating and air evacuation from working chamber.
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