FIELD: micro-electronics, namely control of quality and reliability of semiconductor devices.
SUBSTANCE: intensity of low frequency noise is measured on drain-source contacts with bridged contacts of source-substrate in mode of direct working current of drain transition from external low power source with two current values. Low frequency noise parameter α is determined using expression where and - noise intensity values at currents I1 and I2. On basis of value of α, resistance to secondary breakdown is determined.
EFFECT: increased efficiency.
1 tbl
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Authors
Dates
2007-09-27—Published
2005-11-14—Filed