FIELD: power semiconductor devices.
SUBSTANCE: power bipolar transistors for high-frequency switching. A high-voltage bipolar transistor with static induction contains a single-crystalline substrate of n+-type conductivity with an epitaxial layer of n-type conductivity, local p+-type gate regions in a near-surface epitaxial layer of n-type conductivity and local n+-type sequentially made on it, source regions between p+-type regions, ohmic contacts to n+- and p+-type regions of the transistor structure, as well as electrically strengthening dividing p+-type conductivity rings or mesa-region along the periphery of the active part of the crystal with an etching depth of up to n+- type of single-crystal substrate, while the crystal structure of the high-voltage bipolar transistor is made on the basis of gallium arsenide GaAs single-crystal substrate of n+-type conductivity with a GaAs epitaxial layer of n-type conductivity grown on it, local source heterolayers of AlGaAs n+-type conductivity and GaAs n+-type conductivity on the surface of the n+-AlGaAs heterolayer and GaAs p+-type conductivity gate regions adjacent to the source n+-GaAs/n+-AlGaAs local regions made on it.
EFFECT: increasing performance, reducing parasitic gate capacities, enhancing the specific current density, and sharply reducing the levels of parasitic reverse currents.
2 cl, 5 dwg
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Authors
Dates
2023-10-24—Published
2023-05-16—Filed