METHOD OF POLISHING SURFACE OF SUBSTRATE Russian patent published in 2008 - IPC B24B1/00 B24B37/04 

Abstract RU 2320466 C2

FIELD: working of monocrystals.

SUBSTANCE: method comprises positioning the substrate surface and chemical-mechanical polishing of the surface with an abrasion suspension and polishing paste. The oriented substrate is clamped on the plate made of a high-melting metal. The substrate is then polished with a polishing plate that is pressed to the substrates with a value of 1-2 kg/cm2 and rotates with a speed of 40-60 m/s.

EFFECT: enhanced quality of monocrystals.

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Authors

Avdeev Oleg Valer'Evich

Makarov Jurij Nikolaevich

Nagaljuk Sergej Stepanovich

Savchenko Jurij Ivanovich

Fomicheva Alina Iosifovna

Chemekova Tat'Jana Jur'Evna

Dates

2008-03-27Published

2005-11-23Filed