METHOD OF PRODUCING HIGH PURITY SILICON Russian patent published in 2008 - IPC C01B33/27 

Abstract RU 2327639 C2

FIELD: metallurgy.

SUBSTANCE: invention refers to obtaining a high pure silicon which can be used at production of solar elements. Pure silicon dioxide is melted at a temperature of 1900°C and a mixture of powders of pure silicon and silicon dioxide taken at a stoichiometric ratio is introduced into the melt. The resulted gaseous silicon monoxide is then reduced in a gaseous phase with pure methane at a temperature of 2300-2500°C and elementary silicon is produced.

EFFECT: allows to upgrade purity of processed silicon and to reduce its production cost.

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RU 2 327 639 C2

Authors

Kolmogorov Jurij Georgievich

Antonov Aleksandr Nikolaevich

Afanas'Ev Valerij Davidovich

Gribov Boris Georgievich

Zinov'Ev Konstantin Vladimirovich

Dates

2008-06-27Published

2006-08-22Filed