DEVICE FOR NANO-CLUSTER PLATING Russian patent published in 2009 - IPC C23C14/35 B81C3/00 

FIELD: nanotechnology.

SUBSTANCE: invention relates to micro- and nanotechnologies. Magnetron, outfitted by hollow tubular cathode-target (1), affixed by means of electromagnetic directional device (EDD) to working chamber (2), in which it is mounted holder (3) of treated product. Magnetron is outfitted by additional cooling cathode-target (5), dispersion plane of which is perpendicular to side surface of tubular cathode-target (1). EDD consists of co-axial located coil (6) of electromagnet, magnetic conductor, including implemented of ferromagnetic material electrically isolated from each other hollow cylinder (7), round plate (8) and annular bush (9), installed directly before entrance into working chamber (2), and aluminium bush (10), opening of which is implemented as diminished in direction of plasma transportation. Tubular cathode-target (1) is located inside the cylinder (7), plate (8) and additional cathode-target (5) are installed sequentially in direction of plasma transportation from the side of butt of tubular cathode-target. Coil (6) is located between side walls of cylinder (7) and tubular cathode-target (1), and bush (10) is connected to insert (9) of magnetic conductor.

EFFECT: nomenclature expansion of plated nano-cluster platings ensured by deregulation in point of amount and properties of components of covering materials and padding.

4 cl, 3 dwg