MAGNETRON Russian patent published in 2003 - IPC

FIELD: deposition of coats, electrical and mechanical engineering, optics, electronics, medicine and some other branches of industry and science. SUBSTANCE: invention refers to deposition of coats different in composition. It is related to ion-plasma sputtering equipment employing crossed magnetic and electric fields. Magnetron includes target-cathode, cylindrical hollow anode put on dielectric holder and carrying external groove across edge facing cathode which forms circular slot vertical with reference to cathode together with dielectric holder, cooled magnetic system comprising magnets and magnetic circuit placed on non-working side of target and gear pressing target to magnetic system. Internal surface of anode comes in the form of truncated cone facing target with smaller base. Relation of length to width of circular slot exceeds 10:1 while width is under 2.0 mm. Profiled nonmagnetic membrane having recess housing target is positioned between target and magnetic system. Magnetic circuit is provided with cooling conduit and is placed immediately adjacent to membrane. EFFECT: simplified design of magnetron, its increased operational reliability. 1 dwg