FIELD: instrument engineering.
SUBSTANCE: present invention concerns nano-imprinting stamp designed for imprinting the millimicron (nano) and millimeter structures. Nano-imprinting stamp 1 has a major component and a first and second imprinting component 2, 3, with lithographic pattern 7 to be imprinted in a printable substrate. In first aspect, first and the second imprinting components 2, 3 can be displaced independently in a direction practically parallel to that of imprinting of the imprinting stamp. In the second aspect, first and second imprinting components 2, 3 are loosely coupled mechanically in a direction practically parallel to that of imprinting of the imprinting stamp. The stamp limits impact of defects in the substrate printed with the lithographic pattern 7, or thereon, and defects in the stamp or thereon, and any combinations of such defects by localisation of stamp bend in the major component 5 between imprinting components 2, 3.
EFFECT: design of the flexible stamp for "НВЛ" which can limit impact of defects in the substrate.
31 cl, 7 dwg
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Authors
Dates
2009-08-27—Published
2005-09-07—Filed