FIELD: shaping.
SUBSTANCE: invention is used for pressing out relief. The essence of the invention is that a device for pressing out relief includes a silicon standard, which contains a combination of nano-relief elements. On the silicon standard, a layer in the form of a coating is applied that prevents sticking, which includes a molecule containing cyclosiloxane having at least one silane functional group. A method includes forming the silicon standard by precipitating on the silicon standard, including the combination of nano-relief elements, a composition, which includes a solvent and the molecule containing cyclosiloxane having at least one silane functional group, and curing the composition, which leads to the formation of the layer that prevents sticking on the silicon standard, wherein the layer that prevents sticking includes the specified molecule. The method additionally includes precipitating material of a working stamp based on silicon on the layer of a standard pattern that prevents sticking; curing material of the working stamp based on silicon, which leads to the formation of the working stamp including a negative copy of the combination of nano-relief elements; and separating the working stamp and the standard pattern.
EFFECT: providing the possibility of high-precise nano-pressing of patterns.
34 cl, 20 dwg
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Authors
Dates
2021-08-12—Published
2017-12-19—Filed