METHOD FOR PERFORMANCE OF SHADED MASK X-RAY LITHOGRAPHY Russian patent published in 2009 - IPC G03B42/02 

FIELD: physics.

SUBSTANCE: method for performance of shaded mak X-ray lithography, in which X-ray mask that contains bearing membrane with metal X-ray absorbing topological pattern formed on its working surface and processed substrate with a layer of X-ray resist applied on its working surface is installed on the way of synchrotron radiation, at that X-ray mask is installed closer to the source of radiation, and above mentioned working surfaces are located as distanced from each other at a certainly low gap, parallel to each other and orthogonal to falling exposure radiation, which differs by the fact that polymer film transparent for exposure radiation is introduced into gap.

EFFECT: lower variation of exposure dose and increase of structural materials amount.

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