APPARATUS OF MAGNETRON SPUTTERING Russian patent published in 2010 - IPC C23C14/35 

Abstract RU 2385967 C2

FIELD: machine building.

SUBSTANCE: laminated magnets (3) are installed around the columned running shaft (2). During rotation of columned running shaft (2) on target (1) it is formed area of high density erosion in order to increase velocity of film formation. As this area of erosion is moved together with rotation of columned running shaft (2), target (1) is consumed uniformly.

EFFECT: increasing film formation velocity by means of increasing of erosion density on target at each movement and prolongation of lifetime of target by means of achievement of uniform consumption of movement of erosion area with time.

36 cl, 26 dwg

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RU 2 385 967 C2

Authors

Okhmi Tadakhiro

Goto Tetsuja

Matsuoka Takaaki

Dates

2010-04-10Published

2006-10-06Filed