FIELD: planar magnetrons.
SUBSTANCE: invention relates to a planar magnetron with uniform target erosion. Said magnetron contains a housing in which the target and magnets are placed. The case is made of magnetic material. The target is a rectangular target measuring 530 mm x 100 mm and 10 mm thick. The magnets are a central linear magnet, a peripheral magnet and two arc-shaped magnets mounted to the left and right of the central linear magnet. Said rectangular target is located above the central linear and peripheral magnets. Between the central linear and peripheral magnets and the lower surface of said rectangular target, a sealed cavity is formed, made with the possibility of inlet and outlet of cooling water to remove heat generated in the rectangular target.
EFFECT: increased uniformity of target erosion with the possibility of achieving a uniform distribution of the magnetic field.
1 cl, 5 dwg, 1 ex
Title | Year | Author | Number |
---|---|---|---|
COMBINED TARGET FOR A PLANAR MAGNETRON AND METHOD FOR ITS MANUFACTURE | 2022 |
|
RU2798494C1 |
MAGNETRON SPRAYING SYSTEM | 2002 |
|
RU2242821C2 |
DEVICE FOR HIGH-SPEED MAGNETRON SPUTTERING | 2006 |
|
RU2311492C1 |
MAGNETRON SPUTTERING DEVICE | 2018 |
|
RU2747487C2 |
MAGNETRON WITH COOLING SYSTEM | 2023 |
|
RU2817411C1 |
ZINC OXIDE FILMS DEPOSITION METHOD | 2006 |
|
RU2316613C1 |
SMALL-SIZE MAGNETRON ATOMISER | 2008 |
|
RU2390580C1 |
DEVICE FOR APPLYING MULTI-LAYER COATINGS | 2006 |
|
RU2308538C1 |
DUAL MAGNETRON SPRAY-TYPE SYSTEM | 2008 |
|
RU2371514C1 |
GAS-DISCHARGE SPUTTERING APPARATUS BASED ON PLANAR MAGNETRON WITH ION SOURCE | 2020 |
|
RU2752334C1 |
Authors
Dates
2022-12-19—Published
2022-07-07—Filed