METHOD AND APPARATUS FOR PURIFYING TRICHLOROSILANE AND SILICON TETRACHLORIDE Russian patent published in 2010 - IPC C01B33/107 

FIELD: chemistry.

SUBSTANCE: invention can be used to produce trichlorosilane and/or silicon tetrachloride for electronic industry. The apparatus has a fractionating column 1, where diphenylthiocarbazone and/or triphenylchloromethane added to industrial trichlorosilane and/or industrial silicon tetrachloride form macro-molecular complexes with admixtures. The admixtures are selected from a group comprising boron, boron trichloride, metals and their combinations. As a result of fractionation, a first stillage residue is obtained, as well as a first overhead product which undergoes fractionation in column 2 to form a second stillage residue and a second overhead product which is trichlorosilane for the electronic industry and/or silicon tetrachloride for the electronic industry. The apparatus can also have a fractionating column 3 for separating dichlorosilane and trichlorosilane present in the second stillage residue.

EFFECT: invention enables efficient removal of admixtures from industrial trichlorosilane and/or industrial silicon tetrachloride.

18 cl, 1 dwg, 2 tbl, 1 ex