PROCEDURE FOR FABRICATION OF COATING AND FACILITY FOR IMPLEMENTATION OF THIS PROCEDURE Russian patent published in 2010 - IPC C23C14/48 H05H1/24 H05H1/42 

FIELD: metallurgy.

SUBSTANCE: invention refers to procedure and facility for fabrication of coating. Coating is produced by ion sedimentation on a preliminary cleaned substrate. Sedimentation is performed from axial zone of flow of jet diaphragm discharge with power of E ions corresponding to condition: E_bond<E<E_sputter, where E_bond is power of atoms bond of synthesised substance of coating layer, keV, E_sputter, is power of sputtering substance in the synthesised layer of coating, keV, of specified duration. When coating is settled, an item is annealed during an interval sufficient for re-combination of between-nodular atoms and vacancies, for saturation of not filled chemical bonds in the layer of coating and for creation of stable chemical compounds upon completion of chemical absorption on surface of coating. A separating chamber and a sedimentation chamber of the facility are pressure tight connected to the discharge chamber. The separating chamber is arranged before the sedimentation chamber and has an inlet window in kind of a screen with a mould and an orifice of diametre equal to diametre of the axial zone of discharge jet, it also has an outlet window in form of a geometric nozzle, dimensions and shape of which facilitate super sound acceleration of plasma flow. High voltage pulse source of electric current ensures specified amplitude of discharge current.

EFFECT: invention facilitates stable fabrication of high qualitative coating out of wide range of materials of high adhesion to substrates out of metals, dielectrics and transistors.

2 cl, 3 dwg, 1 ex