FIELD: medicine.
SUBSTANCE: invention refers to medical equipment, particularly to titanium implant surface preparation before bioactive deposition and can be used for metal microstructure identification. An etchant contains phosphoric acid and ammonium and in addition ethylene glycol at the following quantitative ratio of components, wt %: phosphoric acid - 17-68, ammonium fluoride - 0.008-0.02, ethylene glycol - 2-10, water - the rest.
EFFECT: selective etchant for titanium implants has small etching rate that allows regulating a thickness of the etched layer, without generating a residual layer of lower titanium fluorides.
3 ex
| Title | Year | Author | Number |
|---|---|---|---|
| TITANIUM ETCHANT | 2012 |
|
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|
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| PROCESS OF SELECTIVE ETCHING OF SILICON-CONTAINING LAYER IN MULTILAYER STRUCTURES | 0 |
|
SU1819356A3 |
| METHOD FOR MAKING DENTAL IMPLANT OF NANOTITANIUM USING LASER SURFACE STRUCTURING AND NANOSTRUCTURED COMPOSITE COATING AND IMPLANT | 2019 |
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RU2724437C1 |
