FIELD: electric engineering.
SUBSTANCE: in method of washing and drying of substrates, substrates are stepwise submerged into bath of washing with deionised water, and substrate is scanned with megasound radiation established in bath, along whole width of substrate, and substrate is washed. Afterwards substrate is slowly lifted to drying chamber. In process of substrate withdrawal from deionised water, vapors of organic solvent are fed to its both sides directly to the area of substrate withdrawl with the help of two pipes having a row of holes. Device is proposed for realisation of stated method.
EFFECT: improved quality of washing and drying of substrates, increased efficiency, expansion of technological resources.
4 cl, 6 dwg
| Title | Year | Author | Number |
|---|---|---|---|
| METHOD AND DEVICE TO WASH AND DRY SUBSTRATES | 2012 |
|
RU2510098C1 |
| METHOD AND DEVICE FOR WASHING AND DRYING FLAT GLASS SUBSTRATES | 2005 |
|
RU2309481C2 |
| DEVICE FOR INDIVIDUAL DOUBLE-SIDE PROCESSING OF SQUARE OR RECTANGULAR SUBSTRATES | 2007 |
|
RU2367526C2 |
| DEVICE FOR DOUBLE-SIDED CLEANING OF PLATES | 2004 |
|
RU2275972C1 |
| PLANT FOR WASHING WAFERS | 2015 |
|
RU2618492C2 |
| DEVICE FOR ULTRASONIC CLEANING OF PLATES | 2001 |
|
RU2193462C1 |
| METHOD AND A DEVICE FOR A MEGA-ACOUSTICAL CLEANING OF EMULSION CARRIERS | 2002 |
|
RU2243038C2 |
| DEVICE FOR MACHINING OF SEMICONDUCTOR PLATES | 2005 |
|
RU2295172C2 |
| DEVICE FOR DOUBLE-SIDED PROCESSING OF PLATES, FOR EXAMPLE, PHOTOMASKS | 2006 |
|
RU2328054C1 |
| DEVICE FOR WASHING AND DRYING OF SEMICONDUCTOR WAFERS | 2011 |
|
RU2460593C1 |
