FIELD: metallurgy.
SUBSTANCE: method for obtaining oriented fluoride coatings by method of chemical deposition from vapour phase involves arrangement of bottom layer in deposition zone of chemical deposition reactor at temperature of 250-400°C, deposition of fluoride coating on the bottom layer by mixing the flow of metal-organic compounds which are evaporated within temperature range of 150-300°C and pressure of 1-20 mbar, and fluoride-forming flow. As metal-organic compounds there used are volatile metal-organic compounds not containing fluor. Fluoride-forming flow is generated from solid precursor as a result of its evaporation directly in chemical deposition reactor at temperature of 50-120°C from solid precursor, and acid nonorganic bifluoride is used as precursor. Flow of metal-organic compounds and fluoride-forming flow is supplied to deposition zone either with counter-flow, or by coaxial introduction of flows in the inert gas flow.
EFFECT: range of used bottom layers and metal-organic reagents is enlarged, corrosion of equipment is eliminated at performing this method, protection of the obtained coatings is provided against oxidation, temperature of the process performed decreases and cost of the obtained coatings is reduced.
6 cl, 2 dwg, 4 ex
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Authors
Dates
2010-12-10—Published
2008-10-08—Filed