FEEDER FOR VOLATILE COMPOUNDS SUPPLY TO CHEMICAL GAS-PHASE DEPOSITION REACTORS Russian patent published in 2020 - IPC C23C16/00 C23C16/448 C23C16/455 

FIELD: technological processes.

SUBSTANCE: proposed invention relates to production of thin-film materials by chemical gas-phase deposition. Feeder contains a container for a precursor solution, an evacuated chamber with drying and sublimation zones, a device for movement of the precursor solution through an evacuated chamber from the container for the precursor solution to the drying and sublimation zone of the evacuated chamber. According to the invention, the container for the precursor solution is placed outside the evacuated chamber. Agent for movement of the precursor solution is in form of a thread from a material capable of absorbing the solution of the precursor. Said thread is arranged by one end wound on first coil located in front of container for solution of precursor, and by second end wound on second coil located in evacuated chamber after heating elements of sublimation chamber.

EFFECT: uniform supply of a precursor with low speed, possibility of varying speed of a precursor.

8 cl, 1 dwg, 3 ex