FIELD: chemistry.
SUBSTANCE: substrates are processed in a liquid etching agent consisting of hydrofluoric acid (HF), ammonium fluoride (NH4F) and deionised water (H2O) with components in ratio of 1:2:5 at room temperature for 4±1 minutes. The processing quality is assessed under a microscope based on presence of flashing points, the number of which was equal to 5.
EFFECT: ensuring quality of the pattern, uniform etching and shorter process.
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