METHOD FOR MANUFACTURING A LIGHT-EMITTING DIODE Russian patent published in 2021 - IPC H01L33/22 H01L33/30 

Abstract RU 2755769 C1

FIELD: LED equipment.

SUBSTANCE: method for manufacturing a light-emitting diode based on the AlGaAs/GaAs heterostructure includes the formation of a frontal ohmic contact on the surface of the GaAs contact layer, etching of the AlGaAs/GaAs light-emitting surface using the mask of the frontal ohmic contact and texturing the light-emitting surface of the light-emitting diode using the mask of the frontal ohmic contact by liquid chemical selective etching of the GaAs contact layer of the heterostructure in an etcher containing ammonium hydroxide (NH4OH), peroxide hydrogen (H2O2) and deionized water, and subsequent etching of the AlGaAs layer of the heterostructure to a depth of (0.8-1.1) mcm in an etcher containing ammonium fluoride (NH4F), hydrogen fluoride (HF), hydrogen peroxide and deionized water.

EFFECT: invention makes it possible to increase the intensity of electroluminescence of a light-emitting diode made according to it, provides high manufacturability of the texturing process and reduced cost.

1 cl, 3 dwg, 3 ex

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RU 2 755 769 C1

Authors

Malevskaya Aleksandra Vyacheslavovna

Il'Inskaya Natalia Dmitrievna

Malevsky Dmitry Andreevich

Dates

2021-09-21Published

2021-02-25Filed