FIELD: LED equipment.
SUBSTANCE: method for manufacturing a light-emitting diode based on the AlGaAs/GaAs heterostructure includes the formation of a frontal ohmic contact on the surface of the GaAs contact layer, etching of the AlGaAs/GaAs light-emitting surface using the mask of the frontal ohmic contact and texturing the light-emitting surface of the light-emitting diode using the mask of the frontal ohmic contact by liquid chemical selective etching of the GaAs contact layer of the heterostructure in an etcher containing ammonium hydroxide (NH4OH), peroxide hydrogen (H2O2) and deionized water, and subsequent etching of the AlGaAs layer of the heterostructure to a depth of (0.8-1.1) mcm in an etcher containing ammonium fluoride (NH4F), hydrogen fluoride (HF), hydrogen peroxide and deionized water.
EFFECT: invention makes it possible to increase the intensity of electroluminescence of a light-emitting diode made according to it, provides high manufacturability of the texturing process and reduced cost.
1 cl, 3 dwg, 3 ex
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Authors
Dates
2021-09-21—Published
2021-02-25—Filed