PLASMA TREATMENT DEVICE Russian patent published in 2011 - IPC H05H1/24 

Abstract RU 2420044 C2

FIELD: physics.

SUBSTANCE: plasma treatment device has electrodes, electric discharge space and an electric power supply. The electrodes are formed by embedding a conductive layer in an insulating substrate made of a ceramic sintered body. The electric discharge space is formed between oppositely lying electrodes. The electric power supply triggers an electric discharge by applying voltage to the conductive layers. The insulating substrate of each electrode has connection parts on both ends. The connection parts protrude from the insulating substrate and are connected to each other so as to cover the open parts of corresponding sides of the electric discharge space.

EFFECT: high efficiency of plasma ejection.

9 cl, 9 dwg

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RU 2 420 044 C2

Authors

Sibata Tetsudzi

Taguti Norijuki

Nakazono Josijuki

Dates

2011-05-27Published

2008-02-13Filed