FIELD: process engineering.
SUBSTANCE: proposed device comprises guide element with surface whereon fluid film exists in operation. Note here that main gas flow direction is located along said surface and that guide element is furnished with fluid entrapping channel located between point downstream of guide element and point upstream of said guide element. There is imaginary line located along guide element between upstream point of fluid entrapping channel and downstream point of said channel and inclined at an angle to horizontal direction of gas flow. Note also that fluid entrapping channel runs along at least some section of guide element edge. Invention relates also to application of proposed device and to method of updating said device.
EFFECT: perfected design.
11 cl, 12 dwg, 1 ex
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