METHOD OF DEPOSITING PLATINUM LAYERS ONTO SUBSTRATE Russian patent published in 2011 - IPC H01L21/28 B82B3/00 

FIELD: chemistry.

SUBSTANCE: method of depositing platinum layers onto a substrate involves pre-formation of an intermediate adhesion layer from a mixture of platinum and silicon dioxide nanocrystals on a silicon oxide and/or nitride surface. The intermediate adhesion layer with thickness 1-30 nm can be formed via simultaneous magnetron sputtering using magnetrons with platinum and silicon dioxide targets, respectively.

EFFECT: high quality of elements, processes, reliability during prolonged use, adhesion of the deposited layers to the substrate.

8 cl, 3 dwg