FIELD: chemistry.
SUBSTANCE: substrate is put into the chamber of an apparatus fitted with a magnetron sputtering device, an electric-arc evaporator and a resistance heater. The surface of the substrate is cleaned in glow discharge with non-contact heating of the surface using the resistance heater to temperature 100°C and ionic cleaning is carried using the electric-arc evaporator in an inert gas medium while heating the surface to temperature 300°…350°C. A titanium base layer is then deposited on the substrate through electric-arc evaporation of a titanium cathode in an inert gas medium and alternating layers from two-component titanium nitride and three-component aluminium and titanium nitride are deposited in a gaseous mixture of inert and reaction gases. The titanium nitride layer is deposited first and the aluminium and titanium nitride layer is deposited last. The titanium nitride layers are obtained via magnetron sputtering of a titanium target, and the aluminium and titanium nitride layers are obtained via simultaneous electric-arc evaporation of an aluminium cathode and magnetron sputtering of a titanium target.
EFFECT: high wear-, impact-, thermal-, crack- and corrosion-resistance of the processed surface.
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Authors
Dates
2011-09-20—Published
2010-01-11—Filed