PLANT FOR VACUUM ION-PLASMA TREATMENT OF LONG COMPONENTS Russian patent published in 2012 - IPC C23C8/36 C23C14/48 C23C14/02 C23C8/02 

FIELD: electricity.

SUBSTANCE: plant contains vacuum chamber 1 with component holder 12 with insulated current lead and at least one long electrode 2 of arc plasma source; device for components heating and power supply units for vacuum-arc discharge 3 and component heating device 11. Component heating device 11 is an additional emission chamber 7 insulated by screens and insulators; inside this chamber there is long cathode 8 of vacuum-arc discharge which is electron emitter; emission chamber 7 is connected with vacuum chamber 1 by perforated partition 9 at that perforated holes 10 are located along longitudinal cathode axis 8 of vacuum-arc discharge. At that power supply unit 11 for component heating device has an option of connection to negative pole of emission chamber while positive pole is connected to component holder 12 or electrode 2. Power supply unit 3 of vacuum-arc discharge has an option of connection to negative pole of cathode 8 of vacuum-arc discharge or electrode 2, while positive pole can be connected to emission chamber 7 or vacuum chamber 1.

EFFECT: increase in uniformity of components heating.

2 cl, 1 dwg