UNIT FOR ION-RAY AND PLASMA PROCESSING Russian patent published in 2013 - IPC C23C14/48 C23C14/24 C23C14/35 

Abstract RU 2496913 C2

FIELD: machine building.

SUBSTANCE: unit cylindrical vacuum chamber 1 has loading door 11 equipped with flange joints for mounting of process modules 4, 5, 6, 7, 8. Unit Incorporates gas feed system, exhaust system supply sources and control unit. Besides, it comprises rotary mount for parts to be processed. Unit process modules may be composed of at least one elongated vacuum-arc generator of metal plasma, elongated generator of gas plasma, medium-frequency dual magnetron, metal ion source and gas ion source. Besides, it comprises shift voltage source to support ion implantation and/or coat deposition.

EFFECT: complex surface processing including surface purification and activation, application of various coats, modification of surface by metal and gas plasma.

17 cl, 2 dwg, 1 tbl, 1 ex

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RU 2 496 913 C2

Authors

Smyslov Anatolij Mikhajlovich

Dyblenko Jurij Mikhailovich

Smyslova Marina Konstantinovna

Mingazhev Askar Dzhamilevich

Gordeev Vjacheslav Jur'Evich

Gontjurev Vasilij Andreevich

Rjabchikov Aleksandr Il'Ich

Stepanov Igor' Borisovich

Dates

2013-10-27Published

2011-12-28Filed