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2 425 173

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(51)

IPC

C23C14/02(2006-01-01)

C23C14/22(2006-01-01)

C23C14/56(2006-01-01)

C23C14/58(2006-01-01)

B82B3/00(2006-01-01)

(21) (22)

Application

2009100667/02, 2009-01-11

(24)

Start date

2009-01-11

(22)

Actual filing date

2009-01-11

(45)

Published

2011-07-27

(72)

Inventor

Smyslov Anatolij MikhajlovichSmyslova Marina KonstantinovnaDyblenko Mikhail Jur'EvichMingazhev Askar DzhamilevichSelivanov Konstantin SergeevichGordeev Vjacheslav Jur'EvichRjabchikov Aleksandr Il'IchStepanov Igor' Borisovich

(73)

Holder

Obshchestvo S Ogranichennoj Otvetstvennost'Ju Nauchno-Proizvodstvennoe Predprijatie

INSTALLATION FOR COMBINED ION-PLASMA TREATMENT Russian patent published in 2011 - IPC C23C14/02 C23C14/22 C23C14/56 C23C14/58 B82B3/00

Abstract RU 2425173 C2

FIELD: metallurgy.

SUBSTANCE: installation consists of vacuum cylinder chamber with loading door and flanges for arrangement of process modules facilitating complex treatment of parts in one process cycle of installation operation. Dimensions of the vacuum chamber facilitate treatment of long-length parts. Parts are uniformly and qualitatively processed due to implementation of extensive sources of metal plasma and electric-arc evaporators and a form of the chamber in the installation. The installation is equipped with high-power sources for ion implantation of gas and high power sources of metal plasma. In combination with other ion-plasma and ion-implantation devices the installation facilitates production of nano structured and nano layer coating.

EFFECT: application of filters of drop phase in installation ensures upgraded quality of coating.

17 cl, 1 tbl, 2 dwg, 1 ex

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RU 2 425 173 C2

Authors

Smyslov Anatolij Mikhajlovich

Smyslova Marina Konstantinovna

Dyblenko Mikhail Jur'Evich

Mingazhev Askar Dzhamilevich

Selivanov Konstantin Sergeevich

Gordeev Vjacheslav Jur'Evich

Rjabchikov Aleksandr Il'Ich

Stepanov Igor' Borisovich

Dates

2011-07-27—Published

2009-01-11—Filed