METHOD TO FORM NANOSIZED PATTERN ON SUBSTRATE (VERSIONS) AND STRUCTURE WITH PATTERN COMPRISING NANOSIZED SELF-ASSEMBLED SELF-BUILT STRUCTURES Russian patent published in 2012 - IPC B82B3/00 B82B1/00 

FIELD: nanotechnologies.

SUBSTANCE: invention relates to self-assembling sublithographic nanosized structures in an orderly periodical grid and to methods of their manufacturing. The concept of manufacturing is as follows: the method to form a nanosized pattern on a substrate includes formation of the first stenciled layer, covering the specified area on the substrate, arrangement of a system of first holes in it, each of which has a shape of a rectangular hexagon and which are arranged in cells of the first hexagonal grid, formation of the first nanosized self-assembled self-built structures in the first holes, formation of the second stenciled layer covering the specified section, arrangement of a system of second holes in the second stenciled layer, each of which has a shape of regular hexagon and which are arranged in cells of the second hexagonal grid, formation of the second nanosized self-assembled self-built structures in the second holes, formation of the third stenciled layer covering the specified section, arrangement of a system of third holes in the third stenciled layer, every of which has a shape of regular hexagon, and which are arranged in cells of the third hexagonal grid, and formation of the third nanosize self-assembled self-built structures in third holes.

EFFECT: invention makes it possible to produce a nanosized self-assembled self-built structure that would stretch on a section of larger area.

21 cl, 33 dwg