FIELD: physics.
SUBSTANCE: using the method of local anodic oxidation by applying a voltage between the moving probe of the scanning probe microscope and the semiconductor substrate, a nanolithographic pattern is formed, additionally a film-forming sol based on alkoxy silicon compounds is produced, which is obtained in the framework of sol-gel technology, then annealed, as a result, fractal structures with a super-developed surface are formed in places of local anodic oxidation.
EFFECT: ensuring the possibility of forming nanolithographic patterns with a fractal structure with a super-developed surface.
3 dwg
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