METHOD AND DEVICE FOR DEPOSITION OF POLYPARAXYLYLENE THIN LAYERS OF THOSE OF SUBSTITUTED POLYPARAXYLYLENE Russian patent published in 2013 - IPC B05D7/24 

Abstract RU 2481901 C2

FIELD: process engineering.

SUBSTANCE: invention relates to deposition of thin layers of polyparaxylylene. Proposed device comprises heated evaporator to evaporation of initial solid or fluid material. Carrier gas feed tune extends into said evaporator. Carrier gas transfers evaporated initial material, particularly, evaporates polymer, into pyrolysis chamber arranged downstream of said evaporator to decompose initial material. Besides, device comprises chamber arranged downstream of decomposition chamber and provided with gas service passage for decomposed product to be transferred by carrier gas, holder with support surface arranged opposite aforesaid service gas inlet to support substrate to be coated with polymerised decomposed product, and gas outlet. Actively heated gas release surface features high reflectivity and radiation factor ε <0.04. In compliance with this invention, carrier gas is released as dense gas jets from gas release holes arranged over the entire gas release surface. Said gas release jets are combined to make vertical volumetric gas flow extending over the entire support surface. Substrate is arranged on said support surface in heat conducting contact with the entire are of said surface to transmit heat from said actively heated gas release surface to holder. Temperatures measured at whatever two points on substrate surface differ by not over 10°C.

EFFECT: deposition of thin and uniform-depth polymer layer.

29 cl, 8 dwg

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RU 2 481 901 C2

Authors

Gersdorff Markus

Gopi Baskar Pagadala

Mejer Niko

Dates

2013-05-20Published

2009-06-03Filed