FIELD: nanotechnology.
SUBSTANCE: invention relates to the field of manufacture of surface nanostructures and can be used for manufacture of devices of nanoelectronics, nanoplasmonics, chemical and biological sensors, sensors based on surface-enhanced Raman scattering, VLSI, etc. The assigned problem is solved due to the fact that in the method of treatment of surface nanostructure, comprising the effect on the nanostructure with optical radiation, the wavelength is selected in the ultraviolet range, and the radiation intensity is selected less than 100 W/cm2.
EFFECT: increased resistance of nanostructure to effect of heat that enables to increase the mounting density, the operating currents and the operating temperature of the devices based on surface nanostructures without detracting from reliability of their operation.
5 dwg
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