FIELD: chemistry.
SUBSTANCE: method involves sputtering nanostructure material onto a substrate in a vacuum with simultaneous exposure of the substrate to spatially modulated optical radiation. The zero intensity region of the radiation coincides with localisation sites of the nanostructure. Radiation wavelength is chosen such that it lies in the photodesorption band of adsorbed atoms or molecules of the nanostructure material. Intensity of the optical radiation is chosen such that it is higher than critical intensity at which no illuminated parts of the substrate are formed at given rate of sputtering the nanostructure.
EFFECT: easy implementation of the method and high efficiency.
2 dwg
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