FIELD: process engineering.
SUBSTANCE: invention relates to spectral filter for EUV-nanolithograph with extreme ultraviolet radiation with 30-70% transmission over wavelength of 13.4 nm. Said filter is composed by sandwiched film applied on high-transparency support grate with cells made form nickel or gold. Said film comprises 30-50 pairs of Si and Mo or Zr or Nb plies, relatively transparent over 13.4 nm-wavelength, located in symmetry about horizontal plane dividing the filter into two equal halves over its cross-section. Said cells represent hexagons. Besides, this invention covers the method of filter production.
EFFECT: higher strength and transparency of support grate.
2 cl
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Authors
Dates
2014-04-10—Published
2012-04-19—Filed