SYNTHETIC CVD DIAMOND Russian patent published in 2014 - IPC C30B25/02 C30B29/04 C23C16/27 A44C17/00 

Abstract RU 2516574 C2

FIELD: chemistry.

SUBSTANCE: invention relates to technology of production of synthetic diamond material, which can be applied in electronic devices. Diamond material contains single substituting nitrogen ( N s 0 ) in concentration more than 0.5 ppm and having such complete integral absorption in visible area from 350 nm to 750 nm, that at least nearly 35% of absorption is attributed to N s 0 . Diamond material is obtained by chemical deposition from vapour or gas phase (CVD) on substrate in synthesis medium, which contains nitrogen in atomic concentration from nearly 0.4 ppm to nearly 50 ppm, and gas-source contains: atomic part of hydrogen, Hf from nearly 0.40 to nearly 0.75, atom part of carbon, Cf, from nearly 0.15 to nearly 0.30; atomic part of oxygen, Of, from nearly -.13 to nearly 0.40; and Hf+Cf+Of=1; ratio of atomic part of carbon to atomic part of oxygen, Cf:Of, satisfy the ratio nearly 0.45:1<Cf:Of< nearly 1.25:1; and gas-source contains atoms of hydrogen, added in form of hydrogen molecules, H2, with atomic part of the total quantity of present atoms of hydrogen, oxygen and carbon between 0.05 and 0.40; and atomic parts of Hf, Cf and Of represent parts from the total quantity of atoms of hydrogen, oxygen and carbon, present in gas-source.

EFFECT: invention makes it possible to obtain diamond material with rather high content of nitrogen, which is evenly distributed, and which is free of other defects, which provides its electronic properties.

17 cl, 11 dwg, 6 ex

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RU 2 516 574 C2

Authors

Tvitchen Dehniehl Dzhejms

Bennett Ehndrju Majkl

Khan Rizvan Uddin Akhmad

Martin'Ju Filip Moris

Dates

2014-05-20Published

2010-12-15Filed